Hamamatsu Photonics has developed a new semiconductor failure analysis system called the Phemos-X C15765-01, a single unit that uses visible to near-infrared light to analyse semiconductor defects.
This is possible thanks to a newly mounted multi-wavelength laser scanner that applies the company’s optical design technology. Using multi-wavelength light efficiently allows high sensitivity and high resolution essential for localising semiconductor failures. This will improve failure analysis efficiency in diverse semiconductor devices that will be in high demand, such as devices whose circuit line width keeps on shrinking as well as power semiconductors that control electrical power more efficiently than ordinary semiconductor devices.
Sales of the Phemos-X start on 1 April.